Phosphoric Acid is highly selective in etching Si3N4 instead of SiO2. In combination with INTEROX® hydrogen peroxide and water, it is used to etch aluminum and InGaAs selective to InP. Electronic Grade Phosphoric Acid is manufactured in Bernburg, Germany. It is tailored to the needs of the electronic industry with a focus on the wet processing steps in the manufacture of semiconductor wafers. CAS No: 7664-38-2 Information provided by Solvay |